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Phys. Rev. Lett. 101, 226603 (2008) [4 pages]

InSitu Reduction of Charge Noise in GaAs/AlxGa1-xAs Schottky-Gated Devices

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Christo Buizert1,2, Frank H. L. Koppens1, Michel Pioro-Ladrière2, Hans-Peter Tranitz3, Ivo T. Vink1, Seigo Tarucha2,4, Werner Wegscheider3, and Lieven M. K. Vandersypen1,*
1Kavli Institute of NanoScience, Delft University of Technology, PO Box 5046, 2600 GA, The Netherlands
2Quantum Spin Information Project, ICORP, Japan Science and Technology Agency, Atsugi-shi, Kanagawa 243-0198, Japan
3Institut für Angewandte und Experimentelle Physik, Universität Regensburg, Regensburg, Germany
4Department of Applied Physics, University of Tokyo, 7-3-1 Hongo, Bunkyo-ku, 113-8656, Japan

Received 4 August 2008; published 26 November 2008

We show that an insulated electrostatic gate can be used to strongly suppress ubiquitous background charge noise in Schottky-gated GaAs/AlGaAs devices. Via a 2D self-consistent simulation of the conduction band profile we show that this observation can be explained by reduced leakage of electrons from the Schottky gates into the semiconductor through the Schottky barrier, consistent with the effect of “bias cooling.” Upon noise reduction, the noise power spectrum generally changes from Lorentzian to 1/f type. By comparing wafers with different Al content, we exclude that DX centers play a dominant role in the charge noise.

© 2008 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.101.226603
DOI:
10.1103/PhysRevLett.101.226603
PACS:
85.30.−z, 72.20.Jv, 72.70.+m, 73.23.−b

*L.M.K.vandersypen@tudelft.nl