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Phys. Rev. Lett. 102, 076102 (2009) [4 pages]

Intrinsic and extrinsic corrugation of monolayer graphene deposited on SiO2

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V. Geringer1,3, M. Liebmann1,3, T. Echtermeyer2, S. Runte1,3, M. Schmidt1,3, R. Rückamp1,3, M. C. Lemme2, and M. Morgenstern1,3
1II. Institute of Physics, RWTH Aachen University, Otto-Blumenthal-Straße, 52074 Aachen, Germany
2Advanced Microelectronic Center Aachen (AMICA), AMO GmbH, Otto-Blumenthal-Straße 25, 52074 Aachen, Germany
3JARA: Fundamentals of Future Information Technology, Otto-Blumenthal-Straße, 52074 Aachen, Germany

Received 5 June 2008; published 17 February 2009

Using scanning tunneling microscopy in an ultrahigh vacuum and atomic force microscopy, we investigate the corrugation of graphene flakes deposited by exfoliation on a Si/SiO2 (300 nm) surface. While the corrugation on SiO2 is long range with a correlation length of about 25 nm, some of the graphene monolayers exhibit an additional corrugation with a preferential wavelength of about 15 nm. A detailed analysis shows that the long-range corrugation of the substrate is also visible on graphene, but with a reduced amplitude, leading to the conclusion that the graphene is partly freely suspended between hills of the substrate. Thus, the intrinsic rippling observed previously on artificially suspended graphene can exist as well, if graphene is deposited on SiO2.

© 2009 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.102.076102
DOI:
10.1103/PhysRevLett.102.076102
PACS:
68.55.J−, 68.37.Ef, 68.37.Ps, 68.65.−k