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Phys. Rev. Lett. 103, 263601 (2009) [4 pages]

Wave and Particle in Molecular Interference Lithography

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Thomas Juffmann1, Stefan Truppe1, Philipp Geyer1, András G. Major1,*, Sarayut Deachapunya1,2, Hendrik Ulbricht1,3, and Markus Arndt1
1Faculty of Physics, University of Vienna, Boltzmanngasse 5, 1090 Vienna, Austria
2Department of Physics, Faculty of Science, Burapha University, Chonburi 20131, Thailand
3School of Physics and Astronomy, University of Southampton, SO17 1BJ, United Kingdom

Received 21 October 2009; published 29 December 2009

The wave-particle duality of massive objects is a cornerstone of quantum physics and a key property of many modern tools such as electron microscopy, neutron diffraction or atom interferometry. Here we report on the first experimental demonstration of quantum interference lithography with complex molecules. Molecular matter-wave interference patterns are deposited onto a reconstructed Si(111) 7×7 surface and imaged using scanning tunneling microscopy. Thereby both the particle and the quantum wave character of the molecules can be visualized in one and the same image. This new approach to nanolithography therefore also represents a sensitive new detection scheme for quantum interference experiments.

© 2009 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.103.263601
DOI:
10.1103/PhysRevLett.103.263601
PACS:
42.50.St, 03.65.Ta, 03.75.-b

*Present address: Carl Zeiss SMC AG, Rudolf-Eber-Straße 2, 73447 Oberkochen, Germany.