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Phys. Rev. Lett. 104, 016601 (2010) [4 pages]

Theory of the Spin Relaxation of Conduction Electrons in Silicon

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J. L. Cheng1,2, M. W. Wu1, and J. Fabian2,*
1Hefei National Laboratory for Physical Sciences at Microscale and Department of Physics, University of Science and Technology of China, Hefei, Anhui, 230026, China
2Institute for Theoretical Physics, University of Regensburg, 93040 Regensburg, Germany

Received 22 June 2009; published 4 January 2010

A realistic pseudopotential model is introduced to investigate the phonon-induced spin relaxation of conduction electrons in bulk silicon. We find a surprisingly subtle interference of the Elliott and Yafet processes affecting the spin relaxation over a wide temperature range, suppressing the significance of the intravalley spin-flip scattering, previously considered dominant, above roughly 120 K. The calculated spin relaxation times T1 agree with the spin resonance and spin injection data, following a T-3 temperature dependence. The valley anisotropy of T1 and the spin relaxation rates for hot electrons are predicted.

© 2010 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.104.016601
DOI:
10.1103/PhysRevLett.104.016601
PACS:
72.25.Rb, 72.25.Dc, 76.30.Pk

*To whom correspondence should be addressed.

jaroslav.fabian@physik.uni-regensburg.de