Phys. Rev. Lett. 105, 183601 (2010) [4 pages]Quantum Lithography beyond the Diffraction Limit via Rabi Oscillations
See accompanying Physics Synopsis We propose a quantum optical method to do the subwavelength lithography. Our method is similar to the traditional lithography but adding a critical step before dissociating the chemical bound of the photoresist. The subwavelength pattern is achieved by inducing the multi-Rabi oscillation between the two atomic levels. The proposed method does not require multiphoton absorption and the entanglement of photons. It is expected to be realizable using current technology. © 2010 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.105.183601
DOI:
10.1103/PhysRevLett.105.183601
PACS:
42.50.St, 42.50.Ct, 42.50.Gy, 85.40.Hp
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