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Phys. Rev. Lett. 60, 1049–1052 (1988)

Atom-resolved surface chemistry using scanning tunneling microscopy

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R. Wolkow and Ph. Avouris
IBM Research Division, Thomas J. Watson Research Center, Yorktown Heights, New York 10598

Received 7 January 1988; published in the issue dated 14 March 1988

We use scanning tunneling microscopy to investigate the reactivity of the dangling-bond states of Si(111)-(7×7). The reaction with NH3 is used as a prototype. We find that Si rest atoms are more reactive than Si adatoms and that center adatoms are more reactive than corner adatoms. Using atom-resolved electronic spectra, we probe the dangling-bond states on both clean and NH3-exposed surfaces. We find significant interactions and charge transfer between sites which strongly influence surface reactivity.

© 1988 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.60.1049
DOI:
10.1103/PhysRevLett.60.1049
PACS:
61.16.Di, 73.20.At, 82.65.Jv