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Phys. Rev. Lett. 61, 2469–2471 (1988)

Si(100) Surface under an Externally Applied Stress

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F. K. Men, W. E. Packard*, and M. B. Webb
Physics Department, University of Wisconsin, Madison, Wisconsin 53706

Received 11 July 1988; published in the issue dated 21 November 1988

Loading a cantilevered bar allows studying the effect of a uniform, externally applied, and continuously variable strain field on the properties of surfaces. Straining a nominally flat Si(100) surface produces unequal populations of the 2 × 1 and 1 × 2 domains. The domain compressed along the dimer bond is favored. The effect depends on the strain and not the strain gradient. The effect saturates at a strain of 0.1% when 90% of the surface is in the favorable domain. The kinetics of developing and annealing away the asymmetry are identical and thermally activated.

© 1988 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.61.2469
DOI:
10.1103/PhysRevLett.61.2469
PACS:
68.35.Bs, 68.35.Gy

*Present address: Physics Department, University of Notre Dame, Notre Dame, IN 46556.