Phys. Rev. Lett. 61, 428–431 (1988)Scaling of the Droplet-Size Distribution in Vapor-Deposited Thin FilmsReceived 26 April 1988; published in the issue dated 25 July 1988 A dynamic-scaling approach is developed for the description of the droplet-size distribution in vapor-deposited thin films and processes where droplets are formed by nucleation, growth, and coalescence of the droplets. The exponent describing the scaling of the droplet-size distribution and the growth law for the mean droplet size are calculated exactly. A realistic, yet simple, droplet-growth model is developed. The simulation data are found to be consistent with the experiments on vapor-deposited tin and with the theoretical predictions in d=1, 2, and 3. © 1988 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.61.428
DOI:
10.1103/PhysRevLett.61.428
PACS:
64.60.Ak, 64.60.Qb, 68.45.Da, 82.60.Nh
See AlsoComment: M. Kolb, Comment on ‘‘Scaling of the droplet-size distribution in vapor-deposited thin films’’, Phys. Rev. Lett. 62, 1699 (1989). |
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