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Phys. Rev. Lett. 61, 865–868 (1988)

Gas-Phase Quenching of Excitations as a Probe of Dynamics in Porous Silicas

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J. M. Drake, P. Levitz*, and J. Klafter
Exxon Research and Engineering Company, Clinton Township, Annandale, New Jersey 08801

Nicholas J. Turro, K. Stephen Nitsche, and Karen F. Cassidy
Department of Chemistry, Columbia University, New York, New York 10027

Received 11 February 1988; published in the issue dated 15 August 1988

The quenching of an electronically excited adsorbed molecule by gas-phase quenchers within the pore network of several porous silicas has been studied. It is proposed that the early-time quenching rate should scale with the mean pore size, Rp, for gas pressures in the Knudsen regime. We have experimentally observed such scaling in what we believe is the first study of these quenching reactions in a homologous series of morphologically similar porous silicas.

© 1988 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.61.865
DOI:
10.1103/PhysRevLett.61.865
PACS:
68.55.Jk, 42.80.Fn, 82.65.Fr

*On leave from Centre National de la Recherche Scientifique-Centre de Recherche sur les Solides à Organisation Cristalline Imparfaite, 47051-Orleans, Cedex 2, France.

One leave from School of Chemistry, Tel Aviv University, Tel Aviv 69978, Israel.