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Phys. Rev. Lett. 62, 567–570 (1989)

New Mechanism for Hydrogen Desorption from Covalent Surfaces: The Monohydride Phase on Si(100)

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Kumar Sinniah, Michael G. Sherman, Lias B. Lewis*, W. Henry Weinberg†, John T. Yates, Jr., and Kenneth C. Janda
Department of Chemistry and the Surface Science Center, University of Pittsburgh, Pittsburgh, Pennsylvania 15260

Received 19 August 1988; published in the issue dated 30 January 1989

A new mechanism for the thermal desorption of molecular hydrogen from the monohydride phase on Si(100) has been identified. The unusual first-order desorption kinetics that are observed are due to the irreversible excitation of a hydrogen adatom into a delocalized, two-dimensional band state on the surface with an activation energy of 47 kcal/mol. The desorption reaction occurs between this excited hydrogen adatom and a second, localized hydrogen adatom.

© 1989 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.62.567
DOI:
10.1103/PhysRevLett.62.567
PACS:
68.45.Da, 82.20.Pm, 82.65.My, 82.65.Yh

*Permanent address: King's College, Wilkes-Barre, PA 18711.

†Permanent address: Division of Chemistry and Chemical Engineering, California Institute of Technology, Pasadena, CA 91125.

 
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