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Phys. Rev. Lett. 74, 1024–1027 (1995)

Si 2p Core-Level Shifts at the Si(001)-SiO2 Interface: A First-Principles Study

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Alfredo Pasquarello1,2, Mark S. Hybertsen2, and Roberto Car1,3
1Institut Romand de Recherche Numérique en Physique des Matériaux (IRRMA), IN-Ecublens, CH-1015 Lausanne, Switzerland
2AT&T Bell Laboratories, 600 Mountain Avenue, Murray Hill, New Jersey 07974
3Department of Condensed Matter Physics, University of Geneva, CH-1211 Geneva, Switzerland

Received 17 October 1994; published in the issue dated 6 February 1995

Using a first-principles approach, we calculate core-level shifts at the Si(001)-SiO2 interface. By fully relaxing interfaces between Si and tridymite, a crystalline form of SiO2, we obtain interface models with good local structural properties and with no electronic states in the Si gap. Calculated values of Si 2p core-level shifts agree well with data from photoemission experiments and show a linear dependence on the number of nearest-neighbor oxygen atoms. Core-hole relaxation accounts for ∼50% of the total shifts, in good agreement with Auger experiments.

© 1995 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.74.1024
DOI:
10.1103/PhysRevLett.74.1024
PACS:
79.60.Jv, 68.35.-p, 73.20.-r