Phys. Rev. Lett. 80, 1750–1753 (1998)Spin Engineering in Ultrathin Cu/Co/Cu(110)Received 9 July 1997; published in the issue dated 23 February 1998 We have studied the effect of depositing Cu overlayers onto CO gas dosed Co/Cu(110) ultrathin films (6<dCo<30monolayers). We find that submonolayer Cu coverages can completely reverse the in-plane 90° easy axis switch caused by the CO adsorption for all Co thicknesses studied and for sufficiently thick Co films (dCo>15monolayers). This enables us to “controllably engineer” the direction of the easy axis at a constant Co thickness. © 1998 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.80.1750
DOI:
10.1103/PhysRevLett.80.1750
PACS:
75.40.Gb, 75.70.Ak
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