Phys. Rev. Lett. 83, 3872–3875 (1999)Evolution of a Surface-Roughness Spectrum Caused by Stress in Nanometer-Scale Chemical EtchingReceived 10 June 1999; published in the issue dated 8 November 1999 It is reported that a flat free surface of a stressed solid is configurationally unstable under chemical etching and the surface roughness grows with different rates for different spatial frequencies. The theory described in this Letter predicts that with a shallow chemical etching the roughness with spatial frequency below a critical value grows while the roughness of higher frequency decays. The theory was verified via an atomic force microscope experiment with aluminum. This study provides a simple experimental method to measure stress in metals and ceramics. © 1999 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.83.3872
DOI:
10.1103/PhysRevLett.83.3872
PACS:
68.35.Ct, 46.80.+j, 68.45.-v, 81.65.Cf
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