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Phys. Rev. Lett. 84, 3029–3032 (2000)

Scaling Behavior of Cyclical Surface Growth

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Yonathan Shapir1, Subhadip Raychaudhuri1, David G. Foster2,3, and Jacob Jorne3
1Department of Physics and Astronomy, University of Rochester, Rochester, New York 14627
2Eastman Kodak Company, Rochester, New York 14650
3Department of Chemical Engineering, University of Rochester, Rochester, New York 14627

Received 7 October 1999; published in the issue dated 3 April 2000

The scaling behavior of cyclical surface growth (e.g., deposition/desorption), with the number of cycles, n, is investigated. The roughness of surfaces grown by two linear primary processes follows a scaling behavior with asymptotic exponents inherited from the dominant process while the effective amplitudes are determined by both. Relevant nonlinear effects in the primary processes may remain so or be rendered irrelevant. Numerical simulations for several pairs of generic primary processes confirm these conclusions. Experimental results for the surface roughness during cyclical electrodeposition/dissolution of silver show a power-law dependence on n, consistent with the scaling description.

© 2000 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.84.3029
DOI:
10.1103/PhysRevLett.84.3029
PACS:
05.70.Ln, 64.60.Ht, 68.55.Jk, 81.10.Aj