Phys. Rev. Lett. 85, 2733–2736 (2000)Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit
Classical optical lithography is diffraction limited to writing features of a size λ/2 or greater, where λ is the optical wavelength. Using nonclassical photon-number states, entangled N at a time, we show that it is possible to write features of minimum size λ/(2N) in an N-photon absorbing substrate. This result allows one to write a factor of N2 more elements on a semiconductor chip. A factor of N = 2 can be achieved easily with entangled photon pairs generated from optical parametric down-conversion. It is shown how to write arbitrary 2D patterns by using this method. © 2000 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.85.2733
DOI:
10.1103/PhysRevLett.85.2733
PACS:
42.50.Hz, 42.25.Hz, 42.65.-k, 85.40.Hp
See AlsoComment: Girish S. Agarwal, Robert W. Boyd, Elna M. Nagasako, and Sean J. Bentley, Comment on “Quantum Interferometric Optical Lithography: Exploiting Entanglement to Beat the Diffraction Limit”, Phys. Rev. Lett. 86, 1389 (2001). |
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