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APS » Journals » Phys. Rev. Lett. » Volume 86 » Issue 20
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Phys. Rev. Lett. 86, 4516–4519 (2001)

Entangled-State Lithography: Tailoring Any Pattern with a Single State

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Gunnar Björk* and Luis L. Sánchez-Soto
Departamento de Óptica, Facultad de Ciencias Físicas, Universidad Complutense, 28040 Madrid, Spain

Jonas Söderholm
Department of Electronics, Royal Institute of Technology (KTH), Electrum 229, SE-164 40 Kista, Sweden

Received 17 November 2000; published in the issue dated 14 May 2001

We demonstrate a systematic approach to Heisenberg-limited lithographic image formation using four-mode reciprocal binomial states. By controlling the exposure pattern with a simple bank of birefringent plates, any pixel pattern on a (N+1)×(N+1) grid, occupying a square with the side half a wavelength long, can be generated from a 2N-photon state.

© 2001 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.86.4516
DOI:
10.1103/PhysRevLett.86.4516
PACS:
42.50.Hz, 42.25.Hz, 42.65.-k, 85.40.Hp

*On leave from Department of Electronics, Royal Institute of Technology (KTH), Electrum 229, SE-164 40 Kista, Sweden. Electronic addresses: gunnarb@ele.kth.se; http://www.ele.kth.se/QEO/

 
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