Phys. Rev. Lett. 87, 136102 (2001) [4 pages]Morphology Transition during Low-Pressure Chemical Vapor DepositionReceived 28 August 2000; published 10 September 2001 Assuming a reemission model, we have studied, in detail, the effect of sticking coefficient on the morphology evolution in low-pressure chemical vapor deposition processes. We have shown that the surface morphology changes from a self-affine fractal to a columnarlike morphology with increasing sticking coefficient, which agrees qualitatively with experimental observations. © 2001 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.87.136102
DOI:
10.1103/PhysRevLett.87.136102
PACS:
68.55.Jk, 05.10.Gg, 64.60.Ht, 81.15.Gh
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