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Phys. Rev. Lett. 87, 265502 (2001) [4 pages]

Energy Dissipation in Atomic Force Microscopy and Atomic Loss Processes

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Peter M. Hoffmann*
Department of Physics, Wayne State University, 666 W. Hancock, Detroit, Michigan 48201

Steve Jeffery and John B. Pethica
Department of Materials, University of Oxford, Parks Road, Oxford OX1 3PH, United Kingdom

H. Özgür Özer and Ahmet Oral
Department of Physics, Bilkent University, Ankara, Turkey

Received 24 May 2001; published 6 December 2001

Atomic scale dissipation is of great interest in nanomechanics and atomic manipulation. We present dissipation measurements with a linearized, ultrasmall amplitude atomic force microscope which is capable of measuring dissipation at chosen, fixed separations. We show that the dynamic dissipation in the noncontact regime is of the order of a few 10–100 meV per cycle. This dissipation is likely due to the motion of a bistable atomic defect in the tip-surface region. In the contact regime we observe dc hysteresis associated with nanoscale plasticity. We find the hysteretic energy loss to be 1 order of magnitude higher for a silicon surface than for copper.

© 2001 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.87.265502
DOI:
10.1103/PhysRevLett.87.265502
PACS:
62.25.+g, 62.40.+i, 68.35.-p, 68.37.Ps

*Electronic address: hoffmann@physics.wayne.edu