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Phys. Rev. Lett. 88, 156101 (2002) [4 pages]

Observation of Columnar Microstructure in Step-Graded Si1-xGex/Si Films Using High-Resolution X-Ray Microdiffraction

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D. E. Eastman, C. B. Stagarescu, and G. Xu
James Franck Institute, University of Chicago, 5640 S. Ellis Avenue, Chicago, Illinois 60637

P. M. Mooney and J. L. Jordan-Sweet
IBM T. J. Watson Research Center, Yorktown Heights, New York 10598

B. Lai and Z. Cai
Experimental Facilities Division, Advanced Photon Source, Argonne National Laboratory, Argonne, Illinois 60439

Received 8 October 2001; published 27 March 2002

Columnar microstructure in step-graded Si1-xGex/Si(001) structures with low threading dislocation densities has been determined using high angular resolution ( ∼0.005°) x-ray microdiffraction. X-ray rocking curves of a 3-μm-thick strain-relaxed Si0.83Ge0.17 film show many sharp peaks and can be simulated with a model having a set of Gaussians having narrow angular widths (0.013°–0.02°) and local ranges of tilt angles varying from 0.05° to 0.2°. These peaks correspond to individual tilted rectangular columnar micrograins having similar (001) lattice spacings and average areas of 0.8 to 2.0μm2.

© 2002 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.88.156101
DOI:
10.1103/PhysRevLett.88.156101
PACS:
68.55.-a, 61.10.Eq, 61.72.Lk
 
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