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Phys. Rev. Lett. 88, 205502 (2002) [4 pages]

Metastability of Amorphous Silicon from Silicon Network Rebonding

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R. Biswas1, B. C. Pan1,2, and Y. Y. Ye1,3
1Department of Physics and Astronomy, Microelectronics Research Center, and Ames Laboratory, Iowa State University, Ames, Iowa 50011
2Department of Physics, University of Science and Technology of China, Hefei 230026, People's Republic of China
3Center of Analysis and Testing, Wuhan University, Wuhan, People's Republic of China

Received 1 August 2001; published 2 May 2002

We propose a network rebonding model for light-induced metastability in amorphous silicon, involving bonding rearrangements of silicon and hydrogen atoms. Nonradiative recombination breaks weak silicon bonds and generates dangling bond–floating bond pairs, with very low activation energies. The transient floating bonds annihilate, generating local hydrogen motion. Charged defects are also found. Support for these processes is found with tight-binding molecular dynamics simulations. The model accounts for major experimental features of the Staebler-Wronski effect including electron-spin resonance data, the t1/3 kinetics of defect formation, two types of metastable dangling bonds, and hysteretic annealing.

© 2002 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.88.205502
DOI:
10.1103/PhysRevLett.88.205502
PACS:
61.43.Dq, 71.55.Jv, 78.30.Ly