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APS » Journals » Phys. Rev. Lett. » Volume 91 » Issue 25
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Phys. Rev. Lett. 91, 255002 (2003) [4 pages]

Spatial Uniformity of Laser-Accelerated Ultrahigh-Current MeV Electron Propagation in Metals and Insulators

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J. Fuchs1,2,3, T. E. Cowan1,3,*, P. Audebert2, H. Ruhl1,3, L. Gremillet4, A. Kemp1,3, M. Allen1, A. Blazevic5, J.-C. Gauthier2, M. Geissel5, M. Hegelich6, S. Karsch6, P. Parks1, M. Roth5, Y. Sentoku1,3, R. Stephens1, and E. M. Campbell1
1General Atomics, San Diego, California 92121, USA
2Laboratoire pour l’Utilisation des Lasers Intenses, UMR 7605 CNRS-CEA-École Polytechnique-Université Paris VI, 91128 Palaiseau, France
3Physics Department, MS-220, University of Nevada, Reno, Nevada 89557, USA
4Commissariat à l’Énergie Atomique, DPTA, Bruyères-le-Châtel, France
5Gesellschaft für Schwerionenforschung, Darmstadt, Germany
6Max-Planck-Institut für Quantenoptik, Garching, Germany

Received 25 November 2002; published 18 December 2003

The evolution of laser-generated MeV, MA electron beams propagating through conductors and insulators has been studied by comparing measurement and modeling of the distribution of MeV protons that are sheath accelerated by the propagated electrons. We find that electron flow through metals is uniform and can be laser imprinted, whereas propagation through insulators induces spatial disruption of the fast electrons. Agreement is found with material dependent modeling.

© 2003 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.91.255002
DOI:
10.1103/PhysRevLett.91.255002
PACS:
52.38.Kd, 52.70.Nc, 72.90.+y, 78.70.–g

*Corresponding author.

Electronic address: cowan@physics.unr.edu.

 
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