Phys. Rev. Lett. 92, 188302 (2004) [4 pages]Dissociation of a Product of a Surface Reaction in the Gas Phase: XeF2 Reaction with SiReceived 20 September 2003; published 5 May 2004 Xenon difluoride interacts with Si(100)2×1 by atom abstraction, whereby a dangling bond abstracts a F atom from XeF2, scattering the complementary XeF. Partitioning of the reaction exothermicity produces sufficient XeF rovibrational excitation for dissociation to occur. The resulting F and Xe atoms are shown to arise from dissociation of XeF in the gas phase by demonstrating that the angle-resolved velocity distributions of F, Xe, and XeF conserve momentum, energy, and mass. This experiment documents the first observation of dissociation of a surface reaction product in the gas phase. © 2004 The American Physical Society URL:
http://link.aps.org/doi/10.1103/PhysRevLett.92.188302
DOI:
10.1103/PhysRevLett.92.188302
PACS:
82.65.+r, 34.50.Lf, 68.47.Fg, 81.65.Cf
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