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Phys. Rev. Lett. 92, 045501 (2004) [4 pages]

Complexity of Small Silicon Self-Interstitial Defects

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D. A. Richie
High Performance Technologies, Inc., Aberdeen, Maryland 21001, USA

Jeongnim Kim
National Center for Supercomputing Applications, Materials Computation Center, University of Illinois at Urbana-Champaign, Urbana, Illinois 61801, USA

Stephen A. Barr, Kaden R. A. Hazzard, Richard Hennig, and John W. Wilkins
Department of Physics, Ohio State University, Columbus, Ohio 43210, USA

Received 30 May 2003; published 28 January 2004

The combination of long-time, tight-binding molecular dynamics and real-time multiresolution analysis techniques reveals the complexity of small silicon interstitial defects. The stability of identified structures is confirmed by ab initio relaxations. The majority of structures were previously unknown, demonstrating the effectiveness of the approach. A new, spatially extended tri-interstitial ground state structure is identified as a probable nucleation site for larger extended defects and may be key for the compact-to-extended transition.

© 2004 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.92.045501
DOI:
10.1103/PhysRevLett.92.045501
PACS:
61.72.Ji, 71.15.Pd, 71.55.–i, 73.22.–f