corner
corner

Phys. Rev. Lett. 93, 196401 (2004) [4 pages]

Strain Induced Deep Electronic States around Threading Dislocations in GaN

Download: PDF (544 kB) Buy this article Export: BibTeX or EndNote (RIS)

L. Lymperakis and J. Neugebauer*
Fritz-Haber-Institut der Max-Planck-Gesellschaft, Faradayweg 4-6, D-14195 Berlin (Dahlem), Germany
Fakultät für Naturwissenschaften, Universität Paderborn, Fachbereich 6-Physik, D-33095 Paderborn, Germany

M. Albrecht, T. Remmele, and H. P. Strunk
Institut für Werkstoffwissenschaften, Universität Erlangen-Nürnberg, Mikrocharakteriserung, Cauerstrasse 6, D-91058 Erlangen, Germany

Received 22 August 2003; published 1 November 2004

Combining through-focus high-resolution transmission electron microscopy and hierarchical multiscale simulations consisting of density-functional theory, analytical empirical potentials, and continuum elastic theory we demonstrate the existence of a new dislocation type in GaN. In contrast with all previously identified or suggested dislocation structures in GaN, all core atoms are fully coordinated; i.e., no broken bonds occur, implying that the dislocation should be electrically inactive. However, as we show, the giant local strain-field around the dislocation core, in combination with the small lattice constant of GaN, causes deep defect states and thus electrically active edge dislocations independent on the specific core structure.

© 2004 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.93.196401
DOI:
10.1103/PhysRevLett.93.196401
PACS:
71.55.Eq, 68.37.Lp, 71.15.Mb

*Electronic address: neugebauer@fhi-berlin.mpg.de