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Phys. Rev. Lett. 93, 266102 (2004) [4 pages]

Imaging of all Dangling Bonds and their Potential on the Ge/Si(105) Surface by Noncontact Atomic Force Microscopy

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T. Eguchi1, Y. Fujikawa2, K. Akiyama1,3, T. An1,3, M. Ono1, T. Hashimoto4, Y. Morikawa5, K. Terakura6, T. Sakurai2, M. G. Lagally7, and Y. Hasegawa1,3,*
1The Institute for Solid State Physics, The University of Tokyo, 5-1-5 Kashiwa-no-ha, Kashiwa, 277-8581, Japan
2Institute for Materials Research, Tohoku University, 2-1-1 Katahira, Sendai 980-8577, Japan
3PRESTO, Japan Science and Technology Corporation, Japan
4Research Institute for Computational Sciences (RICS), National Institute of Advanced Industrial Science and Technology (AIST), Tsukuba, 305-8568 Japan
5The Institute of Scientific and Industrial Research, Osaka University, Ibaraki 567-0047, Japan
6Creative Research Initiative “Sousei”, Hokkaido University, Sapporo 002-0021, Japan
7University of Wisconsin-Madison, Madison, Wisconsin 53706, USA

Received 10 September 2004; published 20 December 2004

High-resolution noncontact atomic force microscope (AFM) images were successfully taken on the Ge(105)-(1×2) structure formed on the Si(105) substrate and revealed all dangling bonds of the surface regardless of their electronic situation, surpassing scanning tunneling microscopy, whose images strongly deviated from the atomic structure by the electronic states involved. An atomically resolved electrostatic potential profile by a Kelvin-probe method with AFM shows potential variations among the dangling bond states, directly observing a charge transfer between them. These results clearly demonstrate that high-resolution noncontact AFM with a Kelvin-probe method is an ideal tool for analysis of atomic structures and electronic properties of surfaces.

© 2004 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.93.266102
DOI:
10.1103/PhysRevLett.93.266102
PACS:
68.35.Bs, 68.37.Ps, 68.47.Fg, 73.20.–r

*Electronic address: hasegawa@issp.u-tokyo.ac.jp