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APS » Journals » Phys. Rev. Lett. » Volume 95 » Issue 23
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Phys. Rev. Lett. 95, 235004 (2005) [4 pages]

Opacity Effect on Extreme Ultraviolet Radiation from Laser-Produced Tin Plasmas

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Shinsuke Fujioka1,*, Hiroaki Nishimura1, Katsunobu Nishihara1, Akira Sasaki2, Atsushi Sunahara3, Tomoharu Okuno1, Nobuyoshi Ueda1, Tsuyoshi Ando1, Yezheng Tao1, Yoshinori Shimada3, Kazuhisa Hashimoto3, Michiteru Yamaura3, Keisuke Shigemori1, Mitsuo Nakai1, Keiji Nagai1, Takayoshi Norimatsu1, Takeshi Nishikawa4, Noriaki Miyanaga1, Yasukazu Izawa1, and Kunioki Mima1
1Institute of Laser Engineering, Osaka University, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
2Advanced Photon Research Center, Kansai Research Establishment, Japan Atomic Energy Research Institute, 8-1 Umemidai, Kizu, Kyoto 619-0215, Japan
3Institute for Laser Technology, 2-6 Yamada-Oka, Suita, Osaka 565-0871, Japan
4Department of Electrical and Electronic Engineering, Okayama University, 1-1 Naka 1-chome, Tsushima, Okayama 700-8350, Japan

Received 22 September 2005; published 29 November 2005

Opacity effects on extreme ultraviolet (EUV) emission from laser-produced tin (Sn) plasma have been experimentally investigated. An absorption spectrum of a uniform Sn plasma generated by thermal x rays has been measured in the EUV range (9–19 nm wavelength) for the first time. Experimental results indicate that control of the optical depth of the laser-produced Sn plasma is essential for obtaining high conversion to 13.5 nm-wavelength EUV radiation; 1.8% of the conversion efficiency was attained with the use of 2.2 ns laser pulses.

© 2005 The American Physical Society

URL:
http://link.aps.org/doi/10.1103/PhysRevLett.95.235004
DOI:
10.1103/PhysRevLett.95.235004
PACS:
52.25.Os, 52.50.Jm, 52.70.La

*Electronic address: sfujioka@ile.osaka-u.ac.jp

 
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